Touch control structure and display apparatus

ABSTRACT

A touch control structure is provided. The touch control structure includes a corner row including a plurality of row mesh blocks electrically connected along a row direction; and a plurality of residual portions in a corner region, and electrically connected to the plurality of row mesh blocks. The touch control structure includes a corner column including a plurality of column mesh blocks electrically connected along a column direction; and a corner column mesh block at least partially in the corner region. The corner column mesh block includes a main portion and a plurality of protrusion portions along an edge of the main portion. The plurality of residual portions and the plurality of protrusion portions are alternately arranged along a direction substantially parallel to the edge of the main portion. The touch control structure further includes a residual connecting conductive plate electrically connecting the plurality of residual portions together.

TECHNICAL FIELD

The present invention relates to display technology, more particularly,to a touch control structure and a display apparatus.

BACKGROUND

Various types of touch panels have been developed. Examples of touchpanels include one-glass-solution (OGS) touch panels, on-cell touchpanels, and in-cell touch panels. The on-cell touch panels provide hightouch control accuracy. The on-cell touch panels can be classified intosingle-layer-on-cell (SLOC) touch panels and multi-layer-on-cell (MLOC)touch panels. In particular, multiple point touch control can beachieved in the MLOC touch panels with superior touch control accuracyand blanking effects.

SUMMARY

In one aspect, the present disclosure provides a touch controlstructure, comprising a plurality of first mesh electrodes arrangedrespectively in a plurality of rows and a plurality of second meshelectrodes arranged respectively in a plurality of columns; wherein acorner row of the plurality of first mesh electrodes comprises aplurality of row mesh blocks electrically connected along a rowdirection; and a plurality of residual portions in a corner region, andelectrically connected to the plurality of row mesh blocks; wherein acorner column of the plurality of second mesh electrodes comprises aplurality of column mesh blocks electrically connected along a columndirection; and a corner column mesh block at least partially in thecorner region; wherein the corner column mesh block comprises a mainportion and a plurality of protrusion portions along an edge of the mainportion; wherein the plurality of residual portions and the plurality ofprotrusion portions are alternately arranged along a directionsubstantially parallel to the edge of the main portion; wherein thetouch control structure further comprises a residual connectingconductive plate electrically connecting the plurality of residualportions together, the residual connecting conductive plate extendingalong a periphery of a combination of the plurality of protrusionportions and the plurality of residual portions.

Optionally, the touch control structure further comprises a protrusionconnecting conductive plate electrically connecting the plurality ofprotrusion portions together, multiple mesh lines of a respective one ofthe plurality of protrusion portions directly connected to theprotrusion connecting conductive plate, the protrusion connectingconductive plate extending along the periphery of the combination of theplurality of protrusion portions and the plurality of residual portions.

Optionally, the touch control structure further comprises a plurality ofresidual connecting bridges respectively crossing over and insulatedfrom the protrusion connecting conductive plate.

Optionally, the touch control structure further comprises a plurality ofresidual conductive plates respectively connected to the plurality ofresidual portions, multiple mesh lines of a respective one of theplurality of residual portions directly connected to a respective one ofthe plurality of residual conductive plates; wherein a respective one ofthe plurality of residual connecting bridges connects a respective oneof the plurality of residual conductive plates to the residualconnecting conductive plate; and in a region between the respective oneof the plurality of residual conductive plates and the residualconnecting conductive plate, a portion of the protrusion connectingconductive plate is between the respective one of the plurality ofresidual conductive plates and the residual connecting conductive plate.

Optionally, the plurality of row mesh blocks comprises an adjacent meshblock; the touch control structure further comprises an adjacentconductive plate, multiple mesh lines of the adjacent mesh blockdirectly connected to the adjacent conductive plate; wherein theresidual connecting conductive plate is connected to the adjacentconductive plate.

Optionally, the touch control structure further comprises a first touchsignal line, a portion of which on a side of the adjacent conductiveplate away from the adjacent mesh block, the first touch signal lineextending along a periphery of a combination of the adjacent conductiveplate and the adjacent mesh block; wherein the protrusion connectingconductive plate is connected to the first touch signal line.

Optionally, in a first crossing-over region, the residual connectingconductive plate is connected to the adjacent conductive plate, and theprotrusion connecting conductive plate is connected to the first touchsignal line; the touch control structure further comprises a firstconnecting portion and a second connecting portion respectively in thefirst crossing-over region, and a touch insulating layer between thefirst connecting portion and the second connecting portion; the firstconnecting portion connects the residual connecting conductive plate andthe adjacent conductive plate together; and the second connectingportion connects the protrusion connecting conductive plate and thefirst touch signal line together.

Optionally, each of the residual connecting conductive plate, theadjacent conductive plate, at least a portion of the protrusionconnecting conductive plate outside of crossing-over regions, and thefirst touch signal line, comprises a double-layer structure; and thedouble-layer structure comprises a first sub-layer in a same layer asthe first connecting portion and a second sub-layer in a same layer asthe second connecting portion.

Optionally, the touch control structure further comprises a firstinterference preventing plate, the first interference preventing platecomprising a first sub-plate, a second sub-plate, and a third connectingportion connecting the first sub-plate and the second sub-plate, thethird connecting portion in the first crossing-over region and insulatedfrom the first connecting portion by the touch insulating layer; whereinthe first sub-plate is between a portion of the residual connectingconductive plate and a portion of the protrusion connecting conductiveplate; and the second sub-plate is on a side of the first touch signalline away from the adjacent conductive plate.

Optionally, the first interference preventing plate is configured to beprovided with a square wave scanning signal; wherein the square wavescanning signal is same as a touch scanning signal provided to touchscanning electrodes of the touch control structure.

Optionally, each of the residual connecting conductive plate, theadjacent conductive plate, at least a portion of the protrusionconnecting conductive plate outside of crossing-over regions, the firsttouch signal line, the first sub-plate, and the second sub-plate,comprises a double-layer structure; and the double-layer structurecomprises a first sub-layer in a same layer as the first connectingportion and a second sub-layer in a same layer as the second connectingportion.

Optionally, the touch control structure further comprises vias extendingthrough the touch insulating layer, the second sub-layer electricallyconnected to the first sub-layer through a respective via extendingthrough the touch insulating layer.

Optionally, in a second crossing-over region, the residual connectingconductive plate is connected to a respective one of the plurality ofresidual conductive plates through the respective one of the pluralityof residual connecting bridge; and the touch control structure furthercomprises a first interference preventing plate, the first interferencepreventing plate comprising a third sub-plate, a fourth sub-plate, and afourth connecting portion connecting the third sub-plate and the fourthsub-plate, the fourth connecting portion in the second crossing-overregion and insulated from the respective one of the plurality ofresidual connecting bridges by the touch insulating layer; the thirdsub-plate and the fourth sub-plate are between a portion of the residualconnecting conductive plate and a portion of the protrusion connectingconductive plate.

Optionally, the protrusion connecting conductive plate comprises a fifthsub-plate, a sixth sub-plate, and a fifth connecting portion connectingthe fifth sub-plate and the sixth sub-plate, the fifth connectingportion in the second crossing-over region and insulated from therespective one of the plurality of residual connecting bridges by thetouch insulating layer, the fifth connecting portion and the fourthconnecting portion in a same layer.

Optionally, each of the residual connecting conductive plate, therespective one of the plurality of residual conductive plates, the thirdsub-plate, the fourth sub-plate, the fifth sub-plate, and the sixthsub-plate, comprises a double-layer structure; and the double-layerstructure comprises a first sub-layer in a same layer as the fifthconnecting portion and the fourth connecting portion, and a secondsub-layer in a same layer as the respective one of the plurality ofresidual connecting bridge.

Optionally, in a third crossing-over region, the residual connectingconductive plate is connected to the respective one of the plurality ofresidual conductive plates through a second respective one of theplurality of residual connecting bridge; the first interferencepreventing plate further comprises a seventh sub-plate, and a sixthconnecting portion connecting the third sub-plate and the seventhsub-plate, the sixth connecting portion in the third crossing-overregion and insulated from the second respective one of the plurality ofresidual connecting bridges by the touch insulating layer; and theprotrusion connecting conductive plate further comprises an eighthsub-plate and a seventh connecting portion connecting the fifthsub-plate and the eighth sub-plate, the seventh connecting portion inthe third crossing-over region and insulated from the second respectiveone of the plurality of residual connecting bridges by the touchinsulating layer, the fourth connecting portion, the fifth connectingportion, the sixth connecting portion, and the seventh connectingportion in a same layer.

Optionally, the first interference preventing plate further comprises aninner sub-plate between a respective one of the plurality of residualportions and the fifth sub-plate; a first inner connecting bridge, and asecond inner connecting bridge, the first inner connecting bridge andthe second inner connecting bridge respectively connecting the innersub-plate to the third sub-plate; the inner sub-plate, the thirdsub-plate, the first inner connecting bridge, and the second innerconnecting bridge, form a first ring structure; an orthographicprojection of the first ring structure on the touch insulating layersurround an orthographic projection of the fifth sub-plate; and thefirst inner connecting bridge, the second inner connecting bridge, therespective one of the plurality of residual connecting bridges, thesecond respective one of the plurality of residual connecting bridges,are in a same layer.

Optionally, the respective one of the plurality of residual conductiveplates, the respective one of the plurality of residual connectingbridges, the second respective one of the plurality of residualconnecting bridges, and a portion of the residual connecting conductiveplate form a second ring structure; and an orthographic projection ofthe second ring structure on the touch insulating layer surround anorthographic projection of the first ring structure on the touchinsulating layer.

Optionally, each of the residual connecting conductive plate, therespective one of the plurality of residual conductive plates, the innersub-plate, the third sub-plate, the fourth sub-plate, the fifthsub-plate, the sixth sub-plate, the seventh sub-plate, and the eighthsub-plate, comprises a double-layer structure; and the double-layerstructure comprises a first sub-layer in a same layer as the fifthconnecting portion and the fourth connecting portion, and a secondsub-layer in a same layer as the respective one of the plurality ofresidual connecting bridge.

Optionally, the touch control structure further comprises a plurality ofresidual conductive plates respectively connected to the plurality ofresidual portions, multiple mesh lines of a respective one of theplurality of residual portions directly connected to a respective one ofthe plurality of residual conductive plates; and a plurality of residualconnecting bridges respectively crossing over and insulated from theprotrusion connecting conductive plate, a respective one of theplurality of residual connecting bridge connects a respective one of theplurality of residual conductive plates to the residual connectingconductive plate; the plurality of residual portions comprises a lastresidual portion; the plurality of residual conductive plates comprisesa last residual conductive plate; the plurality of residual connectingbridges comprises a first last residual connecting bridge and a secondlast residual connecting bridge respectively connecting the lastresidual portion to the last residual conductive plate; a portion of theresidual connecting conductive plate, the last residual conductiveplate, the first last residual connecting bridge, the second lastresidual connecting bridge form a third ring structure; and orthographicprojections of the protrusion connecting conductive plate andinterference preventing plates on a touch insulating layer are absentinside an orthographic projection of the third ring structure on thetouch insulating layer.

Optionally, the touch control structure further comprises a secondinterference preventing plate extending along a periphery of theresidual connecting conductive plate, the residual connecting conductiveplate between the second interference preventing plate and theprotrusion connecting conductive plate.

In another aspect, the present disclosure provides a display apparatus,comprising the touch control structure described herein or fabricated bya method described herein, a display panel, and an integrated circuitconnected to the display panel.

BRIEF DESCRIPTION OF THE FIGURES

The following drawings are merely examples for illustrative purposesaccording to various disclosed embodiments and are not intended to limitthe scope of the present invention.

FIG. 1 is a partial view of a touch control structure in someembodiments according to the present disclosure.

FIG. 2 is a zoom-in partial view in a corner region of a touch controlstructure in sonic embodiments according to the present disclosure.

FIG. 3 is a zoom-in view of a zoom-in region in FIG. 2.

FIG. 4A is a zoom-in view of a first crossing-over region ire FIG. 2.

FIG. 4B shows a cross-sectional view along an A-A′ line in FIG. 4A.

FIG. 4C shows a cross-sectional view along a B-B′ line in FIG. 4A.

FIG. 4D shows a cross-sectional view along a C-C′ line in FIG. 4A.

FIG. 5A is a zoom-in view of a second crossing-over region in FIG. 2.

FIG. 5B shows a cross-sectional view along a D-D′ line in FIG. 5A.

FIG. 5C shows a cross-sectional view along an E-E′ line in FIG. 5A.

FIG. 5D shows a cross-sectional view along an F-F′ line in FIG. 5A.

FIG. 5E shows a cross-sectional view along a G-G′ line in FIG. 5A.

FIG. 6A is a zoom-in view of a third crossing-over region in FIG. 2.

FIG. 6B shows a cross-sectional view along an H-H′ line in FIG. 6A.

FIG. 6C shows a cross-sectional view along an I-I′ line in FIG. 6A.

FIG. 7 illustrates orthographic projections of a first ring structure, asecond ring structure, and a fifth sub-plate on a touch insulating layerin some embodiments according to the present disclosure.

FIG. 8 illustrates an orthographic projection of a third ring structurein some embodiments according to the present disclosure.

FIG. 9 illustrates the structure around a last residual portion RPL of atouch control structure in some embodiments according to the presentdisclosure.

FIG. 10A is a plan view of a display panel in some embodiments accordingto the present disclosure.

FIG. 10B is a cross-sectional view along a J-J′ line in FIG. 10A.

FIG. 10C is a cross-sectional view along a K-K′ line in FIG. 10A.

FIG. 11 is a cross sectional view of a display panel in some embodimentsaccording to the present disclosure.

FIG. 12 is a schematic diagram illustrating the structure of a displayapparatus having a touch control structure in some embodiments accordingto the present disclosure.

DETAILED DESCRIPTION

The disclosure will now be described more specifically with reference tothe following embodiments. It is to be noted that the followingdescriptions of some embodiments are presented herein for purpose ofillustration and description only. It is not intended to be exhaustiveor to be limited to the precise form disclosed.

The present disclosure provides, inter alia, a touch substrate and adisplay apparatus that substantially obviate one or more of the problemsdue to limitations and disadvantages of the related art. In one aspect,the present disclosure provides a touch control structure. In someembodiments, the touch control structure includes a plurality of firstmesh electrodes arranged respectively in a plurality of rows and aplurality of second mesh electrodes arranged respectively in a pluralityof columns. In some embodiments, a corner row of the plurality of firstmesh electrodes includes a plurality of row mesh blocks electricallyconnected along a row direction; and a plurality of residual portions ina corner region, and electrically connected to the plurality of row meshblocks. In some embodiments, a corner column of the plurality of secondmesh electrodes includes a plurality of column mesh blocks electricallyconnected along a column direction; and a corner column mesh block atleast partially in the corner region. Optionally, the corner column meshblock includes a main portion and a plurality of protrusion portionsalong an edge of the main portion. Optionally, the plurality of residualportions and the plurality of protrusion portions are alternatelyarranged along a direction substantially parallel to the edge of themain portion. Optionally, the touch control structure further includes aresidual connecting conductive plate electrically connecting theplurality of residual portions together, the residual connectingconductive plate extending along a periphery of a combination of theplurality of protrusion portions and the plurality of residual portions.

Flexible multi-layer on-cell touch (FMLOC) technology is utilized toform mesh electrode pattern on top of an encapsulating layer of adisplay panel. The mesh electrode pattern includes touch scanningelectrodes and touch sensing electrodes, and optionally fill patterns(“dummy patterns”). A touch detection integrated circuit is configuredto detect a touch by sensing a mutual capacitance between a touchscanning electrode and a touch sensing electrode, and a change of themutual capacitance upon a touch. In a corner region of a touch controlstructure, touch electrodes are truncated as compared to an internaltouch electrode, resulting in a relatively smaller mutual capacitance.As a result, a value of the change of mutual capacitance detected in thecorner region is relatively smaller than that detected in an internalregion of the touch control structure, leading to a lowered touchdetection sensitivity in the corner region.

The inventors of the present disclosure discover that, unexpectedly andsurprisingly, the lowered touch detection sensitivity in the cornerregion can be significantly improved by having an intricate touchcontrol structure including a protrusion connecting conductive plate anda residual connecting conductive plate as disclosed herein. In thepresent touch control structure, the mutual capacitance can becompensated while at the same time scanning/sensing signal interferencecan be reduced, resulting in significantly improved touch controlperformance, particularly in the corner region.

Mesh electrodes include mesh lines which typically have a line width ina range of 1 μm to 50 μm. Thus, connecting adjacent mesh blocks throughthe mesh lines is particularly difficult, and often resulting in poorconnectivity. The present disclosure adopts a novel and advantageoustouch electrode design that obviate issues in related touch controlstructures.

FIG. 1 is a partial view of a touch control structure in someembodiments according to the present disclosure. Referring to FIG. 1,the touch control structure in some embodiments includes a plurality offirst mesh electrodes TE1 arranged respectively in a plurality of rowsand a plurality of second mesh electrodes TE2 arranged in respectively aplurality of columns. Optionally, the touch control structure is amutual capacitance type touch control structure. Optionally, theplurality of first mesh electrodes TE1 are a plurality of touch scanningelectrodes, and the plurality of second mesh electrodes TE2 are aplurality of touch sensing electrodes. Optionally, the plurality of meshtouch electrodes TE1 are a plurality of touch sensing electrodes, andthe plurality of second mesh electrodes TE2 are a plurality of touchscanning electrodes. Optionally, the touch control structure is in atouch control region of a display panel. Optionally, the touch controlregion substantially overlaps with a display region of the displaypanel. The display panel is configured to display an image in at least aportion of the touch control region.

Referring to FIG. 1, in some embodiments, at least one row of theplurality of rows of first mesh electrodes is a corner row RC, and atleast one column of the plurality of columns of second mesh electrodesis a corner column CC. As used herein, a corner row RC refers to a rowof the plurality of first mesh electrodes TE1 that includes a pluralityof row mesh blocks RMB electrically connected along a row direction; anda plurality of residual portions RP in a corner region CR, andelectrically connected to the plurality of row mesh blocks RMB. As usedherein, a corner column CC refers to a column of the plurality of secondmesh electrodes TE2 that includes a plurality of column mesh blocks CMBelectrically connected along a column direction; and a corner columnmesh block CCMB at least partially in the corner region CR. As usedherein, a corner region CR refers to a region where two edges of thetouch control structure meet each other. The corner region CR itself mayhave an edge that is non-parallel to either of the two edges of thetouch control structure. The corner region CR optionally may be variousappropriate contour shapes. In one example, the corner region CR has anarch-shaped contour. In another example, the corner region CR has aradiused edge along the arch-shaped contour. In another example, thecorner region CR has a straight line contour, and a straight-line edgeis non-parallel to either of the two edges of the touch controlstructure. In another example, the corner region CR has an irregularcontour shape.

Referring to FIG. 1, the corner column mesh block CCMB in someembodiments includes a main portion MP (encircled by a diamond-shapeddotted line area) and a plurality of protrusion portions PP (“fingers”)along an edge E of the main portion MP. Optionally, the plurality ofresidual portions RP and the plurality of protrusion portions PP arealternately arranged along a direction substantially parallel to theedge E of the main portion MP. In one example, the plurality of residualportions RP and the plurality of protrusion portions PP are arranged inan RP-PP-RP-PP-RP-PP pattern, including three residual portions andthree protrusion portions alternately arranged along the directionsubstantially parallel to the edge E of the main portion MP.

FIG. 2 is a zoom-in partial view in a corner region of a touch controlstructure in some embodiments according to the present disclosure.Referring to FIG. 1 and FIG. 2, the touch control structure in someembodiments further includes a protrusion connecting conductive platePCCP electrically connecting the plurality of protrusion portions PPtogether, and a residual connecting conductive plate RCCP electricallyconnecting the plurality of residual portions RP together. Optionally,multiple mesh lines of a respective one of the plurality of protrusionportions PP directly connected to the protrusion connecting conductiveplate PCCP. The protrusion connecting conductive plate PCCP extendsalong a periphery of a combination of the plurality of protrusionportions PP and the plurality of residual portions RP. The residualconnecting conductive plate RCCP extends along the periphery of thecombination of the plurality of protrusion portions PP and the pluralityof residual portions RP.

FIG. 3 is a zoom-in view of a zoom-in region in FIG. 2. Referring toFIG. 3, the touch control structure in some embodiments further includesa plurality of residual conductive plates RCP respectively connected tothe plurality of residual portions RP. Multiple mesh lines of arespective one of the plurality of residual portions RP are directlyconnected to a respective one of the plurality of residual conductiveplates RCP. In some embodiments, a plurality of residual connectingbridges RCB respectively cross over the protrusion connecting conductiveplate PCCP. The plurality of residual connecting bridges RCB areinsulated from the protrusion connecting conductive plate PCCP, e.g., bya touch insulating layer. Optionally, a respective one of the pluralityof residual connecting bridges RCB connects a respective one of theplurality of residual conductive plates RCP to the residual connectingconductive plate RCCP. Optionally, in a region between the respectiveone of the plurality of residual conductive plates RCP and the residualconnecting conductive plate RCCP, a portion of the protrusion connectingconductive plate PCCP is between the respective one of the plurality ofresidual conductive plates RCP and the residual connecting conductiveplate RCCP.

Referring to FIG. 1 and FIG. 2, the plurality of row mesh blocks RMB inthe corner row RC include an adjacent mesh block ARMB. Optionally, theadjacent mesh block ARMB is at least partially in the corner region CR.Optionally, the adjacent mesh block ARMB is outside the corner regionCR. The adjacent mesh block ARMB is adjacent to the plurality ofresidual portions RP.

FIG. 4A is a zoom-in view of a first crossing-over region in FIG. 2.Referring to FIG. 1, FIG. 2, and FIG. 4A, the touch control structure insome embodiments further includes an adjacent conductive plate ACP.Optionally, multiple mesh lines of the adjacent mesh block ARMB aredirectly connected to the adjacent conductive plate ACP. Optionally, theresidual connecting conductive plate RCCP is also connected to theadjacent conductive plate ACP.

In some embodiments, the touch control structure further includes aplurality of first touch signal lines respectively connected to theplurality of first mesh electrodes TE1, and a plurality of second touchsignal lines respectively connected to the plurality of second meshelectrodes TE2. Referring to FIG. 1, FIG. 2, and FIG. 4A, the touchcontrol structure in some embodiments further includes a first touchsignal line TSL (one of the plurality of first touch signal lines).Optionally, a portion of the first touch signal line TSL is on a side ofthe adjacent conductive plate ACP away from the adjacent mesh blockARMB. Optionally, the first touch signal line TSL extends along aperiphery of a combination of the adjacent conductive plate ACP and theadjacent mesh block ARMB. Optionally, the protrusion connectingconductive plate PCCP is connected to the first touch signal line TSL.

In some embodiments, and referring to FIG. 1. FIG. 2, and FIG. 4A, inthe first crossing-over region COR1, the residual connecting conductiveplate RCCP is connected to the adjacent conductive plate ACP, and theprotrusion connecting conductive plate PCCP is connected to the firsttouch signal line TSL. FIG. 4B shows a cross-sectional view along anA-A′ line in FIG. 4A. FIG. 4C shows a cross-sectional view along a B-B′line in FIG. 4A, FIG. 4D shows a cross-sectional view along a C-C′ linein FIG. 4A. As shown in FIG. 4A to FIG. 4D, in some embodiments, thetouch control structure further includes a first connecting portion CP1and a second connecting portion CP2 respectively in the firstcrossing-over region COR1; and a touch insulating layer TI between thefirst connecting portion CP1 and the second connecting portion CP2. Thefirst connecting portion CP1 connects the residual connecting conductiveplate RCCP and the adjacent conductive plate ACP together. The secondconnecting portion CP2 connects the protrusion connecting conductiveplate PCCP and the first touch signal line TSL together.

In some embodiments, each of the residual connecting conductive plateRCCP, the adjacent conductive plate ACP, at least a portion of theprotrusion connecting conductive plate PCCP outside of crossing-overregions, and the first touch signal line TSL, includes a double-layerstructure. Optionally, the double-layer structure includes a firstsub-layer in a same layer as the first connecting portion CP1 and asecond sub-layer in a same layer as the second connecting portion CP2.Optionally, the touch control structure further includes vias extendingthrough the touch insulating layer TI, the second sub-layer electricallyconnected to the first sub-layer through a respective via extendingthrough the touch insulating layer TI.

As used herein, the term “same layer” refers to the relationship betweenthe layers simultaneously formed in the same step. In one example, thefirst sub-layer and the first connecting portion CP1 are in a same layerwhen they are formed as a result of one or more steps of a samepatterning process performed in a material deposited in a samedeposition process. In another example, the first sub-layer and thefirst connecting portion CP1 can be formed in a same layer bysimultaneously performing the step of forming the first sub-layer andthe step of forming the first connecting portion CP1. The term “samelayer” does not always mean that the thickness of the layer or theheight of the layer in a cross-sectional view is the same.

Referring to FIG. 4C, at least a portion of the protrusion connectingconductive plate PCCP outside of crossing-over regions (e.g., outsidethe first crossing-over region COR1) includes a double-layer structure,which includes a first sub-layer in a same layer as the first connectingportion CP1 and a second sub-layer in a same layer as the secondconnecting portion CP2. The second sub-layer is electrically connectedto the first sub-layer through a first via v1 extending through thetouch insulating layer TI.

Referring to FIG. 1, FIG. 2, FIG. 3, and FIG. 4A to FIG. 4D, the touchcontrol structure in some embodiments further includes a firstinterference preventing plate IPB1. Optionally, the first interferencepreventing plate IPB1 extends along a periphery of a combination of theplurality of protrusion portions PP and the plurality of residualportions RP. Optionally, at least a portion of the first interferencepreventing plate IPB1 is on a side of the protrusion connectingconductive plate PCCP away from the plurality of protrusion portions PP.Optionally, at least a portion of the first interference preventingplate IPB1 is on a side of the plurality of residual conductive platesRCP away from the plurality of residual portions RP. Optionally, atleast a portion of the first interference preventing plate IPB1 isbetween the residual connecting conductive plate RCP and each of theplurality of residual conductive plates RCP.

Referring to FIG. 4A to FIG. 4D, the first interference preventing plateIPB1 in some embodiments includes a first sub-plate SP1, a secondsub-plate SP2, and a third connecting portion CP3 connecting the firstsub-plate SP1 and the second sub-plate SP2. Optionally, the thirdconnecting portion CP3 is in the first crossing-over region COR1. Thethird connecting portion CP3 is insulated from the first connectingportion CP1 by the touch insulating layer TI. Optionally, the firstsub-plate SP1 is between a portion of the residual connecting conductiveplate RCCP and a portion of the protrusion connecting conductive platePCCP. Optionally, the second sub-plate SP2 is on a side of the firsttouch signal line TSL away from the adjacent conductive plate ACP.

The first interference preventing plate IPB1 is configured to prevent orreduce the interference between the plurality of first mesh electrodesTE1 and the plurality of second mesh electrodes TE2 in the cornerregion. For example, the first interference preventing plate IPB1 isconfigured to prevent or reduce the interference between the residualconnecting conductive plate RCCP and the protrusion connectingconductive plate PCCP. By having a first interference preventing plateIPB1 between the residual connecting conductive plate RCCP and theprotrusion connecting conductive plate PCCP, interference between touchscanning signals (e.g., Tx signals) and touch sensing signals (e.g., Rxsignals) can be significantly reduced. Optionally, the firstinterference preventing plate IPB1 is configured to be provided with asquare wave scanning signal (e.g., similar to or same as a touchscanning signal provided to touch scanning electrodes of the touchcontrol structure). Optionally, the first interference preventing plateIPB1 is configured to be provided with a constant voltage signal.

In some embodiments, each of the residual connecting conductive plateRCCP, the adjacent conductive plate ACP, at least a portion of theprotrusion connecting conductive plate PCCP outside of crossing-overregions, the first touch signal line TSL, the first sub-plate SP1, andthe second sub-plate SP2, includes a double-layer structure. Optionally,the double-layer structure includes a first sub-layer in a same layer asthe first connecting portion and a second sub-layer in a same layer asthe second connecting portion. Optionally, the touch control structurefurther includes vias extending through the touch insulating layer TI,the second sub-layer electrically connected to the first sub-layerthrough a respective via extending through the touch insulating layerTI.

Referring to FIG. 4D, the first sub-portion SP1 includes a double-layerstructure, which includes a first sub-layer in a same layer as the firstconnecting portion CP1 and a second sub-layer in a same layer as thesecond connecting portion CP2. The second sub-layer is electricallyconnected to the first sub-layer through a second via v2 extendingthrough the touch insulating layer TI.

FIG. 5A is a zoom-in view of a second crossing-over region in FIG. 2.FIG. 5B shows a cross-sectional view along a D-D′ line in FIG. 5A. FIG.5C shows a cross-sectional view along an E-E′ line in FIG. 5A. FIG. 5Dshows a cross-sectional view along an F-F′ line in FIG. 5A. FIG. 5Eshows a cross-sectional view along a G-G′ line in FIG. 5A. Referring toFIG. 1, FIG. 2, FIG. 3, and FIG. 5A to FIG. 5E, in a secondcrossing-over region COR2, the residual connecting conductive plate RCCPis connected to the respective one of the plurality of residualconductive plates RCP through the respective one of the plurality ofresidual connecting bridge RCB.

In some embodiments, the first interference preventing plate IPB1includes a third sub-plate SP3, a fourth sub-plate SP4, and a fourthconnecting portion CP4 connecting the third sub-plate SP3 and the fourthsub-plate SP4. Optionally, the fourth connecting portion CP4 is in thesecond crossing-over region COR2. Optionally, the fourth connectingportion CP4 is insulated from the respective one of the plurality ofresidual connecting bridges RCB by the touch insulating layer TI.Optionally, the third sub-plate SP3 and the fourth sub-plate SP4 arebetween a portion of the residual connecting conductive plate RCCP and aportion of the protrusion connecting conductive plate PCCP.

In some embodiments, the protrusion connecting conductive plate PCCPincludes a fifth sub-plate SP5, a sixth sub-plate SP6, and a fifthconnecting portion CP5 connecting the fifth sub-plate SP5 and the sixthsub-plate SP6. Optionally, the fifth connecting portion CPS is in thesecond crossing-over region COR2. Optionally, the fifth connectingportion CPS is insulated from the respective one of the plurality ofresidual connecting bridges RCB by the touch insulating layer TI.Optionally, the fifth connecting portion CPS and the fourth connectingportion CP4 are in a same layer.

In some embodiments, each of the residual connecting conductive plateRCCP, the respective one of the plurality of residual conductive platesRCP, the third sub-plate SP3, the fourth sub-plate SP4, the fifthsub-plate SP5, and the sixth sub-plate SP6, includes a double-layerstructure. Optionally, the double-layer structure includes a firstsub-layer in a same layer as the fifth connecting portion CP5 and thefourth connecting portion CP4, and a second sub-layer in a same layer asthe respective one of the plurality of residual connecting bridge RCB.

Referring to FIG. 5C, the third sub-portion SP3 includes a double-layerstructure, which includes a first sub-layer in a same layer as thefourth connecting portion CP4 and fifth connecting portion CP5, and asecond sub-layer in a same layer as the respective one of the pluralityof residual connecting bridge RCB. The second sub-layer of the thirdsub-portion SP3 is electrically connected to the first sub-layer of thethird sub-portion SP3 through a third via v3 extending through the touchinsulating layer TI.

Referring to FIG. 5C, the fourth sub-portion SP4 includes a double-layerstructure, which includes a first sub-layer in a same layer as thefourth connecting portion CP4 and fifth connecting portion CP5, and asecond sub-layer in a same layer as the respective one of the pluralityof residual connecting bridge RCB. The second sub-layer of the fourthsub-portion SP4 is electrically connected to the first sub-layer of thefourth sub-portion SP4 through a fourth via v4 extending through thetouch insulating layer TI.

Referring to FIG. 5D, the fifth sub-portion SP5 includes a double-layerstructure, which includes a first sub-layer in a same layer as thefourth connecting portion CP4 and fifth connecting portion CPS, and asecond sub-layer in a same layer as the respective one of the pluralityof residual connecting bridge RCB. The second sub-layer of the fifthsub-portion SP5 is electrically connected to the first sub-layer of thefifth sub-portion SP5 through a fifth via v5 extending through the touchinsulating layer TI.

Referring to FIG. 5D, the sixth sub-portion SP6 includes a double-layerstructure, which includes a first sub-layer in a same layer as thefourth connecting portion CP4 and fifth connecting portion CP5, and asecond sub-layer in a same layer as the respective one of the pluralityof residual connecting bridge RCB. The second sub-layer of the sixthsub-portion SP6 is electrically connected to the first sub-layer of thesixth sub-portion SP6 through a sixth via v6 extending through the touchinsulating layer TI.

FIG. 6A is a zoom-in view of a third crossing-over region in FIG. 2.FIG. 6B shows a cross-sectional view along an H-H′ line in FIG. 6A. FIG.6C shows a cross-sectional view along an I-I′ line in FIG. 6A. Referringto FIG. 1, FIG. 2, FIG. 3, and FIG. 6A to FIG. 6C, in a thirdcrossing-over region COR3, the residual connecting conductive plate RCCPis connected to the respective one of the plurality of residualconductive plates RCP through a second respective one of the pluralityof residual connecting bridge RCB2.

In some embodiments, the first interference preventing plate IPB1includes a seventh sub-plate SP7, and a sixth connecting portion CP6connecting the third sub-plate SP3 and the seventh sub-plate SP7.Optionally, the sixth connecting portion CP6 is in the thirdcrossing-over region COR3. Optionally, the sixth connecting portion CP6is insulated from the second respective one of the plurality of residualconnecting bridges RCB2 by the touch insulating layer TI.

In some embodiments, the protrusion connecting conductive plate PCCPfurther includes an eighth sub-plate SP8 and a seventh connectingportion CP7 connecting the fifth sub-plate SP5 and the eighth sub-plateSP8. Optionally, the seventh connecting portion CP7 is in the thirdcrossing-over region COR3. Optionally, the seventh connecting portionCP7 is insulated from the second respective one of the plurality ofresidual connecting bridges RCB2 by the touch insulating layer TI.Optionally, the fourth connecting portion CP4, the fifth connectingportion CPS, the sixth connecting portion CP6, and the seventhconnecting portion CP7 are in a same layer.

In some embodiments, referring to FIG. 3, FIG. 5A to FIG. 5E, and FIG.6A to FIG. 6C, the first interference preventing plate IPB1 furtherincludes an inner sub-plate SPi between a respective one of theplurality of residual portions RP and the fifth sub-plate SP5; a firstinner connecting bridge ICB1, and a second inner connecting bridge ICB2.The first inner connecting bridge ICB1 and the second inner connectingbridge ICB2 respectively connect the inner sub-plate SPi to the thirdsub-plate SP3. Optionally, the first inner connecting bridge ICB1, thesecond inner connecting bridge ICB2, the respective one of the pluralityof residual connecting bridges RCB, the second respective one of theplurality of residual connecting bridges RCB2, are in a same layer.

In some embodiments, the inner sub-plate SPi, the third sub-plate SP3,the first inner connecting bridge ICB1, and the second inner connectingbridge ICB2, form a first ring structure. FIG. 7 illustratesorthographic projections of a first ring structure, a second ringstructure, and a fifth sub-plate on a touch insulating layer in someembodiments according to the present disclosure. Referring to FIG. 7,optionally, an orthographic projection OR1 of the first ring structureon the touch insulating layer surround an orthographic projection OSP5of the fifth sub-plate.

In some embodiments, the touch control structure includes a plurality offirst ring structures. In one example, a respective one of the pluralityof first ring structures is connected to a first adjacent first ringstructure through the fourth connecting portion CP4 and the fourthsub-plate SP4. In another example, a respective one of the plurality offirst ring structures is connected to a second adjacent first ringstructure through the sixth connecting portion CP6 and the seventhsub-plate SP7.

In some embodiments, the respective one of the plurality of residualconductive plates RCP, the respective one of the plurality of residualconnecting bridges RCB, the second respective one of the plurality ofresidual connecting bridges RCB2, and a portion of the residualconnecting conductive plate RCCP form a second ring structure. Referringto FIG. 7, optionally, an orthographic projection OR2 of the second ringstructure on the touch insulating layer surround an orthographicprojection OR1 of the first ring structure on the touch insulatinglayer.

In some embodiments, the touch control structure includes a plurality ofsecond ring structures. In one example, respective portions of theresidual connecting conductive plate RCCP respectively form respectivefirst sides of the plurality of second ring structures. In anotherexample, the plurality of residual conductive plates RCP respectivelyform respective second sides of the plurality of second ring structures.

In some embodiments, each of the residual connecting conductive plateRCCP, the respective one of the plurality of residual conductive platesRCP, the inner sub-plate SPi, the third sub-plate SP3, the fourthsub-plate SP4, the fifth sub-plate SP5, the sixth sub-plate SP6, theseventh sub-plate SP7, and the eighth sub-plate SP8, includes adouble-layer structure. Optionally, the double-layer structure includesa first sub-layer in a same layer as the fifth connecting portion CP5and the fourth connecting portion CP4, and a second sub-layer in a samelayer as the respective one of the plurality of residual connectingbridge RCB.

Referring to FIG. 6B, the seventh sub-portion SP7 includes adouble-layer structure, which includes a first sub-layer in a same layeras the fourth connecting portion CP4 and fifth connecting portion CP5,and a second sub-layer in a same layer as the respective one of theplurality of residual connecting bridge RCB. The second sub-layer of theseventh sub-portion SP7 is electrically connected to the first sub-layerof the seventh sub-portion SP7 through a seventh via v7 extendingthrough the touch insulating layer TI.

Referring to FIG. 6C, the eighth sub-portion SP8 includes a double-layerstructure, which includes a first sub-layer in a same layer as thefourth connecting portion CP4 and fifth connecting portion CP5, and asecond sub-layer in a same layer as the respective one of the pluralityof residual connecting bridge RCB. The second sub-layer of the eighthsub-portion SP8 is electrically connected to the first sub-layer of theeighth sub-portion SP8 through a eighth via v8 extending through thetouch insulating layer TI.

Referring to FIG. 2, in some embodiments, the plurality of residualportions RP includes a last residual portion RPL, and the plurality ofresidual conductive plates RCP includes a last residual conductive plateRCPL. Optionally, the last residual portion RPL is a residual portionamong the plurality of residual portions RP most distal to the adjacentmesh block ARMB, and the last residual conductive plate RCPL among theplurality of residual conductive plates RCP most distal to the adjacentmesh block ARMB. The plurality of residual connecting bridges RCBincludes a first last residual connecting bridge RCBL1 and a second lastresidual connecting bridge RCBL2 respectively connecting the lastresidual portion RPL to the last residual conductive plate RCPL.Optionally, a portion of the residual connecting conductive plate RCCP,the last residual conductive plate RCPL, the first last residualconnecting bridge RCBL1, the second last residual connecting bridgeRCBL2 form a third ring structure.

FIG. 8 illustrates an orthographic projection of a third ring structurein some embodiments according to the present disclosure. Referring toFIG. 2 and FIG. 8, optionally, orthographic projections of theprotrusion connecting conductive plate PCCP and interference preventingplates (IPB1 or IPB2) on a touch insulating layer are absent inside anorthographic projection of the third ring structure on the touchinsulating layer.

In some embodiments, the first last residual connecting bridge RCBL1. orthe second last residual connecting bridge RCBL2 or both include asingle-layer structure, while the last residual conductive plate RCPL orthe residual connecting conductive plate RCCP or both include adouble-layer structure as described above. For example, as shown in FIG.2, each of the first last residual connecting bridge RCBL1 and thesecond last residual connecting bridge RCBL2 includes a single-layerstructure.

FIG. 9 illustrates the structure around a last residual portion RPL of atouch control structure in some embodiments according to the presentdisclosure. Referring to FIG. 9, each of the first last residualconnecting bridge RCBL1, the second last residual connecting bridgeRCBL2, the last residual conductive plate RCPL, and the residualconnecting conductive plate RCCP includes a double-layer structure.

In some embodiments, the touch control structure further includes asecond touch signal line (one of the plurality of second touch signallines). Referring to FIG. 9, in some embodiments, the residualconnecting conductive plate RCCP is connected to a second touch signalline TSL2.

Referring to FIG. 2, FIG. 3, FIG. 5A, and FIG. 6A, in some embodiments,the touch control structure further includes a second interferencepreventing plate IPB2 extending along a periphery of the residualconnecting conductive plate RCCP. Optionally, the residual connectingconductive plate RCCP is between the second interference preventingplate IPB2 and the protrusion connecting conductive plate PCCP. Thesecond interference preventing plate IPB2 is configured to prevent orreduce the interference between the plurality of first mesh electrodesTE1 and the plurality of second mesh electrodes TE2 in the cornerregion. For example, the second interference preventing plate IPB2 isconfigured to prevent or reduce the interference between the residualconnecting conductive plate RCCP and the protrusion connectingconductive plate PCCP. By having a second interference preventing plateIPB2, interference between touch scanning signals (e.g., Tx signals) andtouch sensing signals (e.g., Rx signals) can be further significantlyreduced. Optionally, the second interference preventing plate IPB2 isconfigured to be provided with a square wave scanning signal (e.g.,similar to or same as a touch scanning signal provided to touch scanningelectrodes of the touch control structure). Optionally, the secondinterference preventing plate IPB2 is configured to be provided with aconstant voltage signal.

Referring to FIG. 2 and FIG. 3, the touch control structure in someembodiments further includes a ground signal line GND configured to beprovided with a ground voltage. Optionally, the ground signal line GNDextends along a periphery of the second interference preventing plateIPB2.

Referring to FIG. 2 and FIG. 4A, the touch control structure in someembodiments further includes a third interference preventing plate IPB3.Optionally, the third interference preventing plate IPB3 is between thefirst touch signal line TSL and the adjacent conductive plate ACP.

Referring to FIG. 2 and FIG. 3, the touch control structure in someembodiments further includes one or more probability of crack detectionlines PCD, used for detecting crack in a panel having the touch controlstructure. Optionally, the one or more probability of crack detectionlines PCD extend along a periphery of the ground signal line GND.

Optionally, mesh lines of the plurality of first mesh electrodes TE1 andthe plurality of second mesh electrodes TE2 have an average line widthin a range of 1 μm to 7 μm, e.g., 1 μm to 2 μm, 2 μm to 3 μm, 3 μm to 4μm, 4 μm to 5 μm, 5 μm to 6 μm, or 6 μm to 7 μm. Optionally, the meshlines have an average line width of 4 μm.

Optionally, the first interference preventing plate IPB1 has a minimumplate width in a range of 4 μm to 30 μm, e.g., 4 μm to 6 μm, 6 μm to 8μm, 8 μm to 10 μm, 10 μm to 15 μm, 15 μm to 20 μm, 20 μm to 25 μm, or 25μm to 30 μm. Optionally, the first interference preventing plate IPB1has a minimum plate width of 10 μm. Optionally, the first interferencepreventing plate IBP1 has an average plate width in a range of 4 μm to30 μm, e.g., 4 μm to 6 μm, 6 μm to 8 μm, 8 μm to 10 μm, 10 μm to 15 μm,15 μm to 20 μm, 20 μm to 25 μm, or 25 μm to 30 μm. Optionally, the firstinterference preventing plate IPB1 has an average plate width of 10 μm.

Optionally, the second interference preventing plate IPB2 has a minimumplate width in a range of 10 μm. to 100 μm, e.g., 10 μm to 20 μm, 20 μmto 30 μm, 30 μm to 40 μm, 40 μm to 50 μm, 50 μm to 60 μm, 60 μm to 70μm, 70 μm to 80 μm, 80 μm to 90 μm, or 90 μm to 100 μm. Optionally, thesecond interference preventing plate IPB2 has a minimum plate width of50 μm. Optionally, the second interference preventing plate IPB2 has anaverage plate width in a range of 4 μm to 30 μm, e.g., 10 μm to 100 μm,e.g., 10 μm to 20 μm, 20 μm to 30 μm, 30 μm to 40 μm, 40 μm to 50 μm, 50μm to 60 μm, 60 μm to 70 μm, 70 μm to 80 μm, 80 μm to 90 μm, or 90 μm to100 μm. Optionally, the second interference preventing plate IPB2 has anaverage plate width of 50 μm.

Optionally, the residual connecting conductive plate RCCP has a minimumplate width in a range of 10 μm to 60 μm, e.g., 10 μm to 20 μm, 20 μm to30 μm, 30 μm to 40 μm, 40 μm to 50 μm, or 50 μm to 60 μm. Optionally,the residual connecting conductive plate RCCP has a minimum plate widthof 50 μm. Optionally, the residual connecting conductive plate RCCP hasan average plate width in a range of 10 μm to 60 μm, e.g., 10 μm to 20μm, 20 μm to 30 μm, 30 μm to 40 μm, 40 μm to 50 μm, or 50 μm to 60 μm.Optionally, the residual connecting conductive plate RCCP has an averageplate width of 28 μm.

Optionally, the protrusion connecting conductive plate PCCP has aminimum plate width in a range of 4 μm to 30 μm, e.g., 4 μm to 6 μm, 6μm to 8 μm, 8 μm to 10 μm, 10 μm to 15 μm, 15 μm to 20 μm, 20 μm to 25μm, or 25 μm to 30 μm. Optionally, the protrusion connecting conductiveplate PCCP has a minimum plate width of 10 μm. Optionally, theprotrusion connecting conductive plate PCCP has an average plate widthin a range of 4 μm to 30 μm, e.g., 4 μm to 6 μm, 6 μm to 8 μm, 8 μm to10 μm, 10 μm to 15 μm, 15 μm to 20 μm, 20 μm to 25 μm, or 25 μm to 30μm. Optionally, the protrusion connecting conductive plate PCCP has anaverage plate width of 10 μm.

Optionally, the plurality of residual conductive plates RCP have aminimum plate width in a range of 4 μm to 30 μm, e.g., 4 μm to 6 μm, 6μm to 8 μm, 8 μm to 10 μm, 10 μm to 15 μm, 15 μm to 20 μm, 20 μm to 25μm, or 25 μm to 30 μm. Optionally, the plurality of residual conductiveplates RCP have a minimum plate width of 10 μm. Optionally, theplurality of residual conductive plates RCP have an average plate widthin a range of 4 μm to 30 μm, e.g., 4 μm to 6 μm, 6 μm to 8 μm, 8 μm to10 μm, 10 m to 15 μm, 15 μm to 20 μm, 20 μm to 25 μm, or 25 μm to 20 μm.Optionally, the plurality of residual conductive plates RCP have anaverage plate width of 10 μm.

As used herein, the term “plate width” refers to a width of a platealong a direction substantially perpendicular to an extension directionof the plate and substantially parallel to a main surface of the touchcontrol structure. In one example, the term “plate width” is a lateralcross-sectional width of the plate. Optionally, the plate width(referring to a plate width of any one of the first interferencepreventing plate IPB1, the second interference preventing plate IPB2,the residual connecting conductive plate RCCP, the protrusion connectingconductive plate PCCP, or the plurality of residual conductive platesRCP) is greater than an average line width of the mesh lines.Optionally, a ratio between the plate width and the line width is in arange 1:1 to 50:1, e.g., 1:1 to 2:1, 2:1 to 3:1, 3:1 to 4:1, 4:1 to 5:1,5:1 to 10:1, 10:1 to 20:1, 20:1 to 30:1, 30:1 to 40:1, or 40:1 to 50:1.

In some embodiments, the plurality of first mesh electrodes TE1 and theplurality of second mesh electrodes TE2 are in a same layer as thesecond sub-layer of the double-layer structure described herein. Thetouch insulating layer TI is between the plurality of first meshelectrodes TE1 and the first sub-layer, and between the plurality ofsecond mesh electrodes TE2 and the first sub-layer. In one example, thesecond connecting portion CP2, the third connecting portion CP3, theplurality of residual connecting bridges RCB, the first inner connectingbridge ICB1, the second inner connecting bridge ICB2, the plurality offirst mesh electrodes TE1, and the plurality of second mesh electrodesTE2 are in a same layer.

In some embodiments, the first connecting portion CP1, the fourthconnecting portion CP4, the fifth connecting portion CP5, the sixthconnecting portion CP6, the seventh connecting portion CP7, are in asame layer as the first sub-layer of the double-layer structuredescribed herein. The touch insulating layer TI is between the secondsub-layer and each of the first connecting portion CP1, the fourthconnecting portion CP4, the fifth connecting portion CP5, the sixthconnecting portion CPG, the seventh connecting portion CP7.

In another aspect, the present disclosure provides a display panelincluding the touch control structure described herein or fabricated bya method described herein, a plurality of display elements, and aplurality of thin film transistors for driving the plurality of displayelements. Optionally, the display elements includes a plurality of lightemitting diodes, for example, in an organic light emitting diode displaypanel. Optionally, the display elements include a liquid crystal layerin a plurality of subpixels, for example, in a liquid crystal displaypanel.

FIG. 10A is a plan view of a display panel in some embodiments accordingto the present disclosure. FIG. 10B is a cross-sectional view along aJ-J′ line in FIG. 10A. FIG. 10C is a cross-sectional view along a K-K′line in FIG. 10A. In some embodiments, the display panel includesdisplay elements and thin film transistors. Optionally, the displayelements includes a plurality of light emitting diodes, for example, inan organic light emitting diode display panel. Optionally, the displayelements include a liquid crystal layer in a plurality of subpixels, forexample, in a liquid crystal display panel. Referring to FIGS. 10B to10C, in some embodiments, the display panel includes a base substrateBS, a plurality of thin film transistors TFT on the base substrate BS,and a plurality of light emitting elements LE on the base substrate BSand respectively connected to the plurality of thin film transistorsTFT.

In some embodiments, the display panel further includes an encapsulatinglayer EN encapsulating the plurality of light emitting elements LE, abuffer layer BUF on a side of the encapsulating layer EN away from thebase substrate BS, a touch insulating layer TI on a side of the bufferlayer BUF away from the encapsulating layer EN. Optionally, the touchcontrol structure further includes a plurality of touch electrodebridges EB. The touch insulating layer TI is between the plurality oftouch electrode bridges EB, and the electrode blocks of the plurality offirst touch electrodes TE1 and the plurality of second touch electrodesTE2. The plurality of touch electrode bridges EB respectively extendthrough vias Vb in the touch insulating layer TI to respectively connectadjacent second electrode blocks in a respective column of the pluralityof column of the plurality of second touch electrodes TE2.

In some embodiments, the plurality of first mesh electrodes TE1 and theplurality of second mesh electrodes TE2 are in a same layer as thesecond sub-layer of the double-layer structure described herein. Thetouch insulating layer TI is between the plurality of first meshelectrodes TE1 and the first sub-layer, and between the plurality ofsecond mesh electrodes TE2 and the first sub-layer. In one example, thesecond connecting portion CP2, the third connecting portion CP3, theplurality of residual connecting bridges RCB, the first inner connectingbridge ICB1, the second inner connecting bridge ICB2, the plurality offirst mesh electrodes TE1 and the plurality of second mesh electrodesTE2 are in a same layer.

In some embodiments, the plurality of touch electrode bridges EB, thefirst connecting portion CP1, the fourth connecting portion CP4, thefifth connecting portion CP5, the sixth connecting portion CP6, theseventh connecting portion CP7, are in a same layer as the firstsub-layer of the double-layer structure described herein. The touchinsulating layer TI is between the second sub-layer and each of thefirst connecting portion CP1, the fourth connecting portion CP4, thefifth connecting portion CP5, the sixth connecting portion CP6, theseventh connecting portion CP7, the plurality of touch electrode bridgesEB.

FIG. 11 is a cross sectional view of a display panel in some embodimentsaccording to the present disclosure. Referring to FIG. 11, in thedisplay region, the display panel includes a base substrate BS, aplurality of thin film transistors TFT on the base substrate BS, apassivation layer PVX on a side of the plurality of thin filmtransistors TFT away from the base substrate BS, a first planarizationlayer PLN1 on side of the passivation layer PVX away from the basesubstrate BS, a relay electrode RE on side of the first planarizationlayer PLN1 away from the passivation layer PVX, a second planarizationlayer PLN2 on a side of the relay electrode RE away from the firstplanarization layer PLN1, a pixel definition layer PDL on a side of thesecond planarization layer PLN2 away from the first planarization layerPLN1 and defining subpixel apertures, an anode AD on a side of thesecond planarization layer PLN2 away from the first planarization layerPLN1, a light emitting layer EL on a side of the anode AD away from thesecond planarization layer PLN2, a cathode CD on a side of the lightemitting layer EL away from the anode AD, a first inorganicencapsulating layer CVD1 on a side of the cathode CD away from lightemitting layer EL, an organic encapsulating layer UP on a side of thefirst inorganic encapsulating layer CVD1 away from the cathode CD, asecond inorganic encapsulating layer CVD2 on a side of the organicencapsulating layer IJP away from the first inorganic encapsulatinglayer CVD1, a buffer layer BUF on a side of the second inorganicencapsulating layer CVD2 away from the organic encapsulating layer IJP,a touch insulating layer TI on a side of the buffer layer BUF away fromthe second inorganic encapsulating layer CVD2, touch electrodes (e.g.,the plurality of first touch electrodes TE1 and the plurality of secondtouch electrodes TE2 as shown in FIG. 23) on a side of the touchinsulating layer TI away from the buffer layer BUF, and an overcoatlayer OC on a side of the touch electrodes away from the touchinsulating layer TI.

In another aspect, the present disclosure provides a display apparatusincluding a display panel described herein or fabricated by a methoddescribed herein, and one or more integrated circuits connected to thedisplay panel. Examples of appropriate display apparatuses include, butare not limited to, an electronic paper, a mobile phone, a tabletcomputer, a television, a monitor, a notebook computer, a digital album,a GPS, etc. Optionally, the display apparatus is an organic lightemitting diode display apparatus. Optionally, the display apparatus is aliquid crystal display apparatus.

FIG. 12 is a schematic diagram illustrating the structure of a displayapparatus having a touch control structure in some embodiments accordingto the present disclosure. In some embodiments, the touch controlstructure further includes a plurality of first touch signal lines SL1respectively connected to the plurality of first mesh electrodes TE1,and a plurality of second touch signal lines SL2 respectively connectedto the plurality of second mesh electrodes TE2. The display apparatusfurther includes a touch control driving integrated circuit TIC. Theplurality of first touch signal lines SL1 and the plurality of secondtouch signal lines SL2 are connected to the touch control drivingintegrated circuit TIC.

In another aspect, the present disclosure provides a method offabricating a touch control structure. In some embodiments, the methodincludes forming a plurality of first mesh electrodes arrangedrespectively in a plurality of rows and forming a plurality of secondmesh electrodes arranged respectively in a plurality of columns.Optionally, forming the plurality of first mesh electrodes includesforming a corner row. Optionally, forming the corner row includesforming a plurality of row mesh blocks electrically connected along arow direction; and forming a plurality of residual portions in a cornerregion, and electrically connected to the plurality of row mesh blocks.Optionally, forming the plurality of second mesh electrodes includesforming a corner column. Optionally, forming the corner column includesforming a plurality of column mesh blocks electrically connected along acolumn direction; and forming a corner column mesh block at leastpartially in the corner region. Optionally, the corner column mesh blockis formed to include a main portion and a plurality of protrusionportions along an edge of the main portion. Optionally, the plurality ofresidual portions and the plurality of protrusion portions are formed tobe alternately arranged along a direction substantially parallel to theedge of the main portion. Optionally, the method further includesforming a residual connecting conductive plate electrically connectingthe plurality of residual portions together. Optionally, the residualconnecting conductive plate is formed to extend along a periphery of acombination of the plurality of protrusion portions and the plurality ofresidual portions.

In some embodiments, the method further includes forming a protrusionconnecting conductive plate electrically connecting the plurality ofprotrusion portions together. Optionally, multiple mesh lines of arespective one of the plurality of protrusion portions are formed to bedirectly connected to the protrusion connecting conductive plate.Optionally, the protrusion connecting conductive plate is formed toextend along the periphery of the combination of the plurality ofprotrusion portions and the plurality of residual portions.

In some embodiments, the method further includes forming a plurality ofresidual conductive plates respectively connected to the plurality ofresidual portions. Optionally, multiple mesh lines of a respective oneof the plurality of residual portions are formed to be directlyconnected to a respective one of the plurality of residual conductiveplates. Optionally, the method further includes forming a plurality ofresidual connecting bridges respectively crossing over and insulatedfrom the protrusion connecting conductive plate. Optionally, arespective one of the plurality of residual connecting bridges is formedto connect a respective one of the plurality of residual conductiveplates to the residual connecting conductive plate. Optionally, in aregion between the respective one of the plurality of residualconductive plates and the residual connecting conductive plate, aportion of the protrusion connecting conductive plate is formed betweenthe respective one of the plurality of residual conductive plates andthe residual connecting conductive plate.

In some embodiments, forming the plurality of row mesh blocks includesforming an adjacent mesh block. Optionally, the method further includesforming an adjacent conductive plate. Optionally, multiple mesh lines ofthe adjacent mesh block are formed to be directly connected to theadjacent conductive plate. Optionally, the residual connectingconductive plate is formed to be connected to the adjacent conductiveplate.

In some embodiments, the method further includes forming a first touchsignal line, a portion of which is formed on a side of the adjacentconductive plate away from the adjacent mesh block. Optionally, thefirst touch signal line is formed to extend along a periphery of acombination of the adjacent conductive plate and the adjacent meshblock. Optionally, the protrusion connecting conductive plate is formedto be connected to the first touch signal line.

In some embodiments, in a first crossing-over region, the residualconnecting conductive plate is formed to be connected to the adjacentconductive plate, and the protrusion connecting conductive plate isformed to be connected to the first touch signal line. Optionally, themethod further includes forming a first connecting portion and forming asecond connecting portion respectively in the first crossing-overregion, and forming a touch insulating layer, the touch insulating layerformed between the first connecting portion and the second connectingportion. Optionally, the first connecting portion is formed to connectthe residual connecting conductive plate and the adjacent conductiveplate together. Optionally, the second connecting portion is formed toconnect the protrusion connecting conductive plate and the first touchsignal line together.

In some embodiments, each of the residual connecting conductive plate,the adjacent conductive plate, at least a portion of the protrusionconnecting conductive plate outside of crossing-over regions, and thefirst touch signal line, is formed as a double-layer structure.Optionally, the double-layer structure is formed to include a firstsub-layer in a same layer as the first connecting portion and a secondsub-layer in a same layer as the second connecting portion.

In some embodiments, the method further includes forming a firstinterference preventing plate. Optionally, forming the firstinterference preventing plate includes forming a first sub-plate,forming a second sub-plate, and forming a third connecting portionconnecting the first sub-plate and the second sub-plate. Optionally, thethird connecting portion is formed in the first crossing-over region andinsulated from the first connecting portion by the touch insulatinglayer.

In some embodiments, the first interference preventing plate isconfigured to be provided with a square wave scanning signal.Optionally, the square wave scanning signal is same as a touch scanningsignal provided to touch scanning electrodes of the touch controlstructure.

In some embodiments, each of the residual connecting conductive plate,the adjacent conductive plate, at least a portion of the protrusionconnecting conductive plate outside of crossing-over regions, the firsttouch signal line, the first sub-plate, and the second sub-plate, isformed as a double-layer structure. Optionally, the double-layerstructure is formed to include a first sub-layer in a same layer as thefirst connecting portion and a second sub-layer in a same layer as thesecond connecting portion.

In some embodiments, the method further includes forming viasrespectively extending through the touch insulating layer. Optionally,the second sub-layer is formed to be electrically connected to the firstsub-layer through a respective via extending through the touchinsulating layer.

In some embodiments, in a second crossing-over region, the residualconnecting conductive plate is formed to be connected to the respectiveone of the plurality of residual conductive plates through therespective one of the plurality of residual connecting bridge.Optionally, forming the first interference preventing plate furtherincludes forming a third sub-plate, forming a fourth sub-plate, andforming a fourth connecting portion connecting the third sub-plate andthe fourth sub-plate. Optionally, the fourth connecting portion isformed in the second crossing-over region and insulated from therespective one of the plurality of residual connecting bridges by thetouch insulating layer.

In some embodiments, forming the protrusion connecting conductive plateincludes forming a fifth sub-plate, forming a sixth sub-plate, andforming a fifth connecting portion connecting the fifth sub-plate andthe sixth sub-plate. Optionally, the fifth connecting portion is formedin the second crossing-over region and insulated from the respective oneof the plurality of residual connecting bridges by the touch insulatinglayer. Optionally, the fifth connecting portion and the fourthconnecting portion are formed in a same layer.

In some embodiments, each of the residual connecting conductive plate,the respective one of the plurality of residual conductive plates, thethird sub-plate, the fourth sub-plate, the fifth sub-plate, and thesixth sub-plate, is formed as a double-layer structure. Optionally, thedouble-layer structure is formed to include a first sub-layer in a samelayer as the fifth connecting portion and the fourth connecting portion,and a second sub-layer in a same layer as the respective one of theplurality of residual connecting bridge.

In some embodiments, in a third crossing-over region, the residualconnecting conductive plate is formed to be connected to the respectiveone of the plurality of residual conductive plates through a secondrespective one of the plurality of residual connecting bridge.Optionally, forming the first interference preventing plate furtherincludes forming a seventh sub-plate, and forming a sixth connectingportion connecting the third sub-plate and the seventh sub-plate.Optionally, the sixth connecting portion is formed in the thirdcrossing-over region and insulated from the second respective one of theplurality of residual connecting bridges by the touch insulating layer.Optionally, forming the protrusion connecting conductive plate furtherincludes forming an eighth sub-plate and forming a seventh connectingportion connecting the fifth sub-plate and the eighth sub-plate.Optionally, the seventh connecting portion is formed in the thirdcrossing-over region and insulated from the second respective one of theplurality of residual connecting bridges by the touch insulating layer.Optionally, the fourth connecting portion, the fifth connecting portion,the sixth connecting portion, and the seventh connecting portion areformed in a same layer.

In some embodiments, forming the first interference preventing platefurther includes forming an inner sub-plate between a respective one ofthe plurality of residual portions and the fifth sub-plate; forming afirst inner connecting bridge, and forming a second inner connectingbridge. Optionally, the first inner connecting bridge and the secondinner connecting bridge are formed to respectively connect the innersub-plate to the third sub-plate. Optionally, the inner sub-plate, thethird sub-plate, the first inner connecting bridge, and the second innerconnecting bridge, form a first ring structure. Optionally, anorthographic projection of the first ring structure on the touchinsulating layer surround an orthographic projection of the fifthsub-plate. Optionally, the first inner connecting bridge, the secondinner connecting bridge, the respective one of the plurality of residualconnecting bridges, the second respective one of the plurality ofresidual connecting bridges, are formed in a same layer.

In some embodiments, the respective one of the plurality of residualconductive plates, the respective one of the plurality of residualconnecting bridges, the second respective one of the plurality ofresidual connecting bridges, and a portion of the residual connectingconductive plate form a second ring structure. Optionally, anorthographic projection of the second ring structure on the touchinsulating layer surround an orthographic projection of the first ringstructure on the touch insulating layer.

In some embodiments, each of the residual connecting conductive plate,the respective one of the plurality of residual conductive plates, theinner sub-plate, the third sub-plate, the fourth sub-plate, the fifthsub-plate, the sixth sub-plate, the seventh sub-plate, and the eighthsub-plate, is formed as a double-layer structure. Optionally, thedouble-layer structure is formed to include a first sub-layer in a samelayer as the fifth connecting portion and the fourth connecting portion,and a second sub-layer in a same layer as the respective one of theplurality of residual connecting bridge.

In some embodiments, the method further includes forming a plurality ofresidual conductive plates respectively connected to the plurality ofresidual portions. Optionally, multiple mesh lines of a respective oneof the plurality of residual portions are formed to be directlyconnected to a respective one of the plurality of residual conductiveplates. Optionally, a plurality of residual connecting bridgesrespectively are formed crossing over and insulated from the protrusionconnecting conductive plate. Optionally, a respective one of theplurality of residual connecting bridge is formed to connect arespective one of the plurality of residual conductive plates to theresidual connecting conductive plate. Optionally, forming the pluralityof residual portions includes forming a last residual portion.Optionally, forming the plurality of residual conductive plates includesforming a last residual conductive plate. Optionally, forming theplurality of residual connecting bridges includes forming a first lastresidual connecting bridge and forming a second last residual connectingbridge, the first last residual connecting bridge and the second lastresidual connecting bridge formed respectively connecting the lastresidual portion to the last residual conductive plate. Optionally, aportion of the residual connecting conductive plate, the last residualconductive plate, the first last residual connecting bridge, the secondlast residual connecting bridge form a third ring structure. Optionally,orthographic projections of the protrusion connecting conductive plateand interference preventing plates on a touch insulating layer areabsent inside an orthographic projection of the third ring structure onthe touch insulating layer.

In some embodiments, the method further includes forming a secondinterference preventing plate extending along a periphery of theresidual connecting conductive plate, the residual connecting conductiveplate between the second interference preventing plate and theprotrusion connecting conductive plate.

The foregoing description of the embodiments of the invention has beenpresented for purposes of illustration and description. It is notintended to be exhaustive or to limit the invention to the precise formor to exemplary embodiments disclosed. Accordingly, the foregoingdescription should be regarded as illustrative rather than restrictive.Obviously, many modifications and variations will be apparent topractitioners skilled in this art. The embodiments are chosen anddescribed in order to explain the principles of the invention and itsbest mode practical application, thereby to enable persons skilled inthe art to understand the invention for various embodiments and withvarious modifications as are suited to the particular use orimplementation contemplated. It is intended that the scope of theinvention be defined by the claims appended hereto and their equivalentsin which all terms are meant in their broadest reasonable sense unlessotherwise indicated. Therefore, the term “the invention”, “the presentinvention” or the like does not necessarily limit the claim scope to aspecific embodiment, and the reference to exemplary embodiments of theinvention does not imply a limitation on the invention, and no suchlimitation is to he inferred. The invention is limited only by thespirit and scope of the appended claims. Moreover, these claims mayrefer to use “first”, “second”, etc. following with noun or element.Such terms should be understood as a nomenclature and should not beconstrued as giving the limitation on the number of the elementsmodified by such nomenclature unless specific number has been given. Anyadvantages and benefits described may not apply to all embodiments ofthe invention. It should be appreciated that variations may be made inthe embodiments described by persons skilled in the art withoutdeparting from the scope of the present invention as defined by thefollowing claims. Moreover, no element and component in the presentdisclosure is intended to be dedicated to the public regardless ofwhether the element or component is explicitly recited in the followingclaims.

1. A touch control structure, comprising a plurality of first meshelectrodes arranged respectively in a plurality of rows and a pluralityof second mesh electrodes arranged respectively in a plurality ofcolumns; wherein a corner row of the plurality of first mesh electrodescomprises: a plurality of row mesh blocks electrically connected along arow direction; and a plurality of residual portions in a corner region,and electrically connected to the plurality of row mesh blocks; whereina corner column of the plurality of second mesh electrodes comprises aplurality of column mesh blocks electrically connected along a columndirection; and a corner column mesh block at least partially in thecorner region; wherein the corner column mesh block comprises a mainportion and a plurality of protrusion portions along an edge of the mainportion; wherein the plurality of residual portions and the plurality ofprotrusion portions are alternately arranged along a directionsubstantially parallel to the edge of the main portion; wherein thetouch control structure further comprises: a residual connectingconductive plate electrically connecting the plurality of residualportions together, the residual connecting conductive plate extendingalong a periphery of a combination of the plurality of protrusionportions and the plurality of residual portions.
 2. The touch controlstructure of claim 1, further comprising a protrusion connectingconductive plate electrically connecting the plurality of protrusionportions together, multiple mesh lines of a respective one of theplurality of protrusion portions directly connected to the protrusionconnecting conductive plate, the protrusion connecting conductive plateextending along the periphery of the combination of the plurality ofprotrusion portions and the plurality of residual portions.
 3. The touchcontrol structure of claim 2, further comprising a plurality of residualconnecting bridges respectively crossing over and insulated from theprotrusion connecting conductive plate.
 4. The touch control structureof claim 3, further comprising a plurality of residual conductive platesrespectively connected to the plurality of residual portions, multiplemesh lines of a respective one of the plurality of residual portionsdirectly connected to a respective one of the plurality of residualconductive plates; wherein a respective one of the plurality of residualconnecting bridges connects a respective one of the plurality ofresidual conductive plates to the residual connecting conductive plate;and in a region between the respective one of the plurality of residualconductive plates and the residual connecting conductive plate, aportion of the protrusion connecting conductive plate is between therespective one of the plurality of residual conductive plates and theresidual connecting conductive plate.
 5. The touch control structure ofclaim 4, wherein the plurality of row mesh blocks comprises an adjacentmesh block; the touch control structure further comprises an adjacentconductive plate, multiple mesh lines of the adjacent mesh blockdirectly connected to the adjacent conductive plate; wherein theresidual connecting conductive plate is connected to the adjacentconductive plate.
 6. The touch control structure of claim 5, furthercomprising a first touch signal line, a portion of which on a side ofthe adjacent conductive plate away from the adjacent mesh block, thefirst touch signal line extending along a periphery of a combination ofthe adjacent conductive plate and the adjacent mesh block; wherein theprotrusion connecting conductive plate is connected to the first touchsignal line.
 7. The touch control structure of claim 6, wherein, in afirst crossing-over region, the residual connecting conductive plate isconnected to the adjacent conductive plate, and the protrusionconnecting conductive plate is connected to the first touch signal line;the touch control structure further comprises a first connecting portionand a second connecting portion respectively in the first crossing-overregion, and a touch insulating layer between the first connectingportion and the second connecting portion; the first connecting portionconnects the residual connecting conductive plate and the adjacentconductive plate together; and the second connecting portion connectsthe protrusion connecting conductive plate and the first touch signalline together.
 8. The touch control structure of claim 7, wherein eachof the residual connecting conductive plate, the adjacent conductiveplate, at least a portion of the protrusion connecting conductive plateoutside of crossing-over regions, and the first touch signal line,comprises a double-layer structure; and the double-layer structurecomprises a first sub-layer in a same layer as the first connectingportion and a second sub-layer in a same layer as the second connectingportion.
 9. The touch control structure of claim 7, further comprising afirst interference preventing plate, the first interference preventingplate comprising a first sub-plate, a second sub-plate, and a thirdconnecting portion connecting the first sub-plate and the secondsub-plate, the third connecting portion in the first crossing-overregion and insulated from the first connecting portion by the touchinsulating layer; wherein the first sub-plate is between a portion ofthe residual connecting conductive plate and a portion of the protrusionconnecting conductive plate; and the second sub-plate is on a side ofthe first touch signal line away from the adjacent conductive plate. 10.The touch control structure of claim 9, wherein the first interferencepreventing plate is configured to be provided with a square wavescanning signal; wherein the square wave scanning signal is same as atouch scanning signal provided to touch scanning electrodes of the touchcontrol structure.
 11. The touch control structure of claim 9, whereineach of the residual connecting conductive plate, the adjacentconductive plate, at least a portion of the protrusion connectingconductive plate outside of crossing-over regions, the first touchsignal line, the first sub-plate, and the second sub-plate, comprises adouble-layer structure; and the double-layer structure comprises a firstsub-layer in a same layer as the first connecting portion and a secondsub-layer in a same layer as the second connecting portion.
 12. Thetouch control structure of claim 8, further comprising vias extendingthrough the touch insulating layer, the second sub-layer electricallyconnected to the first sub-layer through a respective via extendingthrough the touch insulating layer.
 13. The touch control structure ofclaim 3, wherein, in a second crossing-over region, the residualconnecting conductive plate is connected to a respective one of theplurality of residual conductive plates through the respective one ofthe plurality of residual connecting bridge; and the touch controlstructure further comprises a first interference preventing plate, thefirst interference preventing plate comprising a third sub-plate, afourth sub-plate, and a fourth connecting portion connecting the thirdsub-plate and the fourth sub-plate, the fourth connecting portion in thesecond crossing-over region and insulated from the respective one of theplurality of residual connecting bridges by the touch insulating layer;the third sub-plate and the fourth sub-plate are between a portion ofthe residual connecting conductive plate and a portion of the protrusionconnecting conductive plate.
 14. The touch control structure of claim13, wherein the protrusion connecting conductive plate comprises a fifthsub-plate, a sixth sub-plate, and a fifth connecting portion connectingthe fifth sub-plate and the sixth sub-plate, the fifth connectingportion in the second crossing-over region and insulated from therespective one of the plurality of residual connecting bridges by thetouch insulating layer, the fifth connecting portion and the fourthconnecting portion in a same layer.
 15. (canceled)
 16. The touch controlstructure of claim 14, wherein, in a third crossing-over region, theresidual connecting conductive plate is connected to the respective oneof the plurality of residual conductive plates through a secondrespective one of the plurality of residual connecting bridge; the firstinterference preventing plate further comprises a seventh sub-plate, anda sixth connecting portion connecting the third sub-plate and theseventh sub-plate, the sixth connecting portion in the thirdcrossing-over region and insulated from the second respective one of theplurality of residual connecting bridges by the touch insulating layer;and the protrusion connecting conductive plate further comprises aneighth sub-plate and a seventh connecting portion connecting the fifthsub-plate and the eighth sub-plate, the seventh connecting portion inthe third crossing-over region and insulated from the second respectiveone of the plurality of residual connecting bridges by the touchinsulating layer, the fourth connecting portion, the fifth connectingportion, the sixth connecting portion, and the seventh connectingportion in a same layer.
 17. The touch control structure of claim 16,wherein the first interference preventing plate further comprises aninner sub-plate between a respective one of the plurality of residualportions and the fifth sub-plate; a first inner connecting bridge, and asecond inner connecting bridge, the first inner connecting bridge andthe second inner connecting bridge respectively connecting the innersub-plate to the third sub-plate; the inner sub-plate, the thirdsub-plate, the first inner connecting bridge, and the second innerconnecting bridge, form a first ring structure; an orthographicprojection of the first ring structure on the touch insulating layersurround an orthographic projection of the fifth sub-plate; and thefirst inner connecting bridge, the second inner connecting bridge, therespective one of the plurality of residual connecting bridges, thesecond respective one of the plurality of residual connecting bridges,are in a same layer.
 18. The touch control structure of claim 17,wherein the respective one of the plurality of residual conductiveplates, the respective one of the plurality of residual connectingbridges, the second respective one of the plurality of residualconnecting bridges, and a portion of the residual connecting conductiveplate form a second ring structure; and an orthographic projection ofthe second ring structure on the touch insulating layer surround anorthographic projection of the first ring structure on the touchinsulating layer.
 19. (canceled)
 20. The touch control structure ofclaim 1, further comprising a plurality of residual conductive platesrespectively connected to the plurality of residual portions, multiplemesh lines of a respective one of the plurality of residual portionsdirectly connected to a respective one of the plurality of residualconductive plates; and a plurality of residual connecting bridgesrespectively crossing over and insulated from the protrusion connectingconductive plate, a respective one of the plurality of residualconnecting bridge connects a respective one of the plurality of residualconductive plates to the residual connecting conductive plate; theplurality of residual portions comprises a last residual portion; theplurality of residual conductive plates comprises a last residualconductive plate; the plurality of residual connecting bridges comprisesa first last residual connecting bridge and a second last residualconnecting bridge respectively connecting the last residual portion tothe last residual conductive plate; a portion of the residual connectingconductive plate, the last residual conductive plate, the first lastresidual connecting bridge, the second last residual connecting bridgeform a third ring structure; and orthographic projections of theprotrusion connecting conductive plate and interference preventingplates on a touch insulating layer are absent inside an orthographicprojection of the third ring structure on the touch insulating layer.21. The touch control structure of claim 1, further comprising a secondinterference preventing plate extending along a periphery of theresidual connecting conductive plate, the residual connecting conductiveplate between the second interference preventing plate and theprotrusion connecting conductive plate.
 22. A display apparatus,comprising the touch control structure of claim 1, a display panel, andan integrated circuit connected to the display panel.